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AZ Kwik Strip

AZ Kwik Strip
AZ^® Kwik Strip^® remover is a high performance photoresist stripper containing safer solvents that allow for cleaner substrate surfaces and exceptional removal of novolac resins and other organic contaminants. This remover has a neutral pH and will not damage underlying layers of metal. The material is engineered to remove photoresist that has been hard baked up to 170°C. AZ Kwik Strip remover is completely water rinsable and compatible with processes involving automatic wet stripping equipment. The recommended process is double immersion with agitation at room temperature to 90°C. For most applications, fi ve to ten minutes at 60°C is more than suffi cient. AZ Kwik Strip remover is a high purity material fi ltered to 0.2 µm and produced with trace metals controlled to < 50 ppb.

Some Features are:
Amine free, Non-corrosive to Cu, Gatts, and Cu/Al alloys..., biodegradable.

For further information refer AZ Kwik Strip.pdf

^®AZ, the AZ logo, BARLi , Aquatar and Kallista are registered trademarks of AZ Electronic Materials.