MIF Developers (metal-ion-free)
These metal-ion-free developers are all based on
2.38% TMAH. Extremely tight control of normality and
carbon dioxide contamination ensure superb batch to
batch consistency. Worst case deviation translates into
less than 1% activity (photospeed) change. Low trace
metals (less than 5 ppb) and particle counts demonstrate
AZ’s continuos improvement. All developers are
designed for puddle development.
AZ® 326MIF
AZ® 326MIF is 2.38 % TMAH (TetraMethylAmmoniumHydroxide)
in H2O.
AZ® 726MIF
AZ® 726MIF is 2.38 % TMAH in H2O with surfactants
added for fast and homogeneous substrate wetting.
AZ® 826MIF
AZ® 826MIF is 2.38 % TMAH in H2O with surfactants
added for fast and homogeneous substrate wetting, and
further additives for removal of resist residuals
occasionally remaining after development. These
additives, however, slightly increase the dark erosion.
For further information refer AZ MIF_Developer.pdf
®AZ, the AZ logo, BARLi , Aquatar and Kallista are
registered trademarks of AZ Electronic Materials.
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