MicroChemicals GmbH

Photoresists, Ancillaries, Etchants, Solvents, and Technical Support
for all Stages of MicroStructuring and Lithography

 

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Photoresists
Developers
Remover/Stripper
Thinner/EBR
Adhesion Promotion
Etchants
Etching Mixtures
Solvents 

MIC Developers (metal-ion containing)

AZ® Developer (MIC) 
AZ® Developer (MIC) is optimized for minimum Al attack. It is typically applied 1:1 diluted in DI-H2O for high contrast, or undiluted for a high development rate. The dark erosion of AZ® Developer is slightly higher as compared to other developers.
AZ® Developer can be used in combination with most families of AZ Photoresists (i.e. AZ 1500, AZ 6600
and AZ 4500). 
It is designed to meet the demanding microlithographic and processing requirements of the semiconductor industry and tuned to lowest attack of aluminium. It is an odourless, aqueous, inorganic, alkaline solution, which is compatible with batch and in-line developing processes. Precise manufacture and stringent quality control ensure batch-to-batch reproducibility and product quality.
  
AZ Developer is supplied as a concentrate. The standard high-contrast make-up provides superior resolution and contrast as well as broad processing latitude. Use of the concentrated AZ Developer as a high-speed make-up results in very high production throughput. AZ® Developer displays the lowest aluminium etch rate of all AZ Deveoper-types and is ideal for metal levels.
  
For further information refer AZ Developer.pdf

AZ® 351B (MIC)
AZ® 351B (MIC) is based on buffered NaOH and typically used in 1:4 dilution.
  
For further information refer AZ 351B (MIC).pdf

AZ® 400K (MIC)
AZ® 400K (MIC) is based on buffered KOH and typically used in 1:4 dilution.
 
For further information refer AZ 400K (MIC).pdf

AZ® 303 (MIC)
AZ® 303 (MIC) is based on KOH and NaOH and designed for the resist AZ® 111 XFS.
The next selection characteristics is the compatibility of the developer to a certain
photoresist or/and a certain substrate material (table overleaf, bottom).
 
For further information refer AZ 303 (MIC).pdf

 

 

  
®AZ, the AZ logo, BARLi , Aquatar and Kallista are registered trademarks of AZ Electronic Materials.

Overview/ Developer-
Resist Compatibilities
Sales volumes
 

MIF Developers
AZ® 326MIF 
AZ® 726MIF 
AZ® 826MIF 
 

MIC Developers
AZ® 400K 
AZ® 351B 
AZ® 303 
AZ® Developer 

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