Etchants
Acids
Acetic Acid (99.8 %)
Thinner, wetting agent and chemical buffer in various
etching solutions
such as Al-etchants
For further information refer Acetic
Acid.pdf
Hydrofluoric Acid (available in the
concentrations: 1%, 10%, and 50%)
Used for etching of SiO2 and (together with
HNO3) -
silicon.
For further information refer Hydrofluoric
Acid.pdf
Nitric Acid (70 %)
Ingredient of the silicon etchant, and etching
solutions for Ga-containing
III/V-semiconductors.
For further information refer Nitric
Acid 70%.pdf
Hydrochloric Acid (37 %)
Ingredient of aqua regia and etching mixtures for
various III/V-semiconductors
such as InP
For further information refer Hydrochloric
Acid 37%.pdf
Sulphuric Acid (96 %)
Ingredient of the piranha-etch as well as etching
solutions for Ga-containing
III/V-semiconductors
For further information refer Sulphuric
Acid 96%.pdf
Bases
KOH Solution (44 %)
Also used for anisotropic etching of silicon.
For further information refer Potassium
Hydroxide.pdf
Other Etchants
Ammonia Solution (30 %)
Ingredient of the RCA-1 solution
For further information refer Ammonia
Solution 30%.pdf
Hydrogen Peroxide (31 %)
Ingredient of the piranha-etch, RCA-1 and RCA-2 etching solutions,
as well as etching solutions for various III/V-semiconductors
For further information refer Hydrogen
Peroxide 30%.pdf
Sales Volumes, Shipping and Pricing
As listed in the previous section, we supply our
etchants in e. g. 1.0 L, 2.5 L or 5.0 L sales units.
Beside single bottles, we also offer cardboxes of 6 x
1.0 L, 6 x 2.5 L or 4 x 5.0 L.
Our typical lead time is 3-5 working days within
Germany, lead times to other countries on request. On
demand, in urgent cases our etchants can be shipped
within 24 hours within Germany.
Please send your request to:
e-mail: sales@microchemicals.com
phone: +49 (0)731 36080 409
fax: +49 (0)731 36080 908
Thank you very much for your interest!
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