New Products
New Positive Thin Photoresist
AZ ECI 3027 photoresist
AZ® ECI 3027 photoresist series are a family of fast positive resists with high resolution capabilities (0.4 µm CDs in production in i-line) enabling wide process latitudes. The resist family is suited for i-line as well as broadband exposure covering g-, h- and i-line illumination wavelengths. It is designed to have superior implant and dry etch resistance. Further characterization highlights show strong wet etch adhesion and good thermal stability. AZ® ECI 3027 photoresist series are specifically tailored for universal application and excellent cost of ownership.
For further information refer Photoresist AZ ECI 3027.pdf
More about other Positive Thin Photoresists
AZ Kwik Strip
AZ® Kwik Strip® remover is a high performance photoresist stripper containing safer solvents that allow for cleaner substrate surfaces and exceptional removal of novolac resins and other organic contaminants. This remover has a neutral pH and will not damage underlying layers of metal. The material is engineered to remove photoresist that has been hard baked up to 170°C. AZ Kwik Strip remover is completely water rinsable and compatible with processes involving automatic wet stripping equipment. The recommended process is double immersion with agitation at room temperature to 90°C. For most applications, fi ve to ten minutes at 60°C is more than suffi cient. AZ Kwik Strip remover is a high purity material fi ltered to 0.2 µm and produced with trace metals controlled to < 50 ppb.
Some Features are:
Amine free, Non-corrosive to Cu, Gatts, and Cu/Al alloys..., biodegradable.
For further information refer AZ Kwik Strip.pdf
More about other Remover and Stripper
New Spray Coating Resist
AZ 4999
AZ® 4999 is a spray coating dedicated highly
transparent photoresist tailored to excel on special spray coating
equipment (e.g. SUSS Delta AltaSpray) where it provides defect free
and conformal coatings on devices with severe topography.
Thick (several to several tens of microns) and uniform resist
coatings are obtained on topography such as V-grooves and trenches
with optimum coverage of sharp edges.
There is no accumulation of resist in trenches. The use of AZ®
4999 photoresist enables high reproducibility in volume production
applications.
For further information refer Photoresist
AZ 4999.pdf
More about other Spray
Coating Resists
Ethyl Acetate
Ethyl Acetate is a solvent with a boiling point of 77°C. The vapor pressure at roomtemperature 97 hPa. Ethylacetate has the chemical formula is C 4H 8O 2 . It can be easily solved in acetone, and alkohols, but fairly bad in water (80g per Liter).
We sell this material in units of 2.5 Liter in VLSI quality.
For further information refer Ethyl Acetate.pdf
or see our site about our solvents.
New Sizes
We are glad to announce the addition of 500 ml bottles to
our line of 250 ml and 1.000 ml resist small sales volumes.
More about our sales
volumes
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