AZ 111 XFS Photoresist
AZ 111 XFS
AZ® 111 XFS is a special photoresist with excellent
adhesion on all surfaces. The origin of this photoresist
dates back to 1964 (AZ® 111 S). It was one of the first
commercial positive photoresist used for general purpose
applications with contact printing. Meanwhile AZ® 111 XFS,
a safer solvent version of AZ® 111 S, has advanced to
meet today’s demands of semiconductor manufacturing
and is still widely used where outstanding wet-etching
capabilities (adhesion) and low sticking to the mask (proximity
printing) are needed.
For further information refer Photoresist
AZ 111XFS.pdf
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Materials.
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