AZ 1500 Series Photoresists
AZ® 1500-Series:
Positive Thin Resists for Wet Etching
Film thickness: 0.5 ... 2.5 μm
UV-sensitivity: i-, h-, g-line (310 - 440 nm), broadband or monochromatic
Sales volumes: 250 ml, 500 ml, 1000 ml, 2.5 L, and 5 L
General Information
The AZ® 1500 photoresist series yields an improved adhesion to the substrates mak- ing them a good choice for wet chemical etching. Beyond this application, the AZ® 1500 series is well-suited for almost all standard lithographic purposes. The lateral resolution – depending on the resist film thickness – reaches down to sub-μm.
AZ® 1505 and AZ® 1518 standard thin resists cover the thickness range from 0.5 to 2.5 μm. If only one resist is desired for various film thicknesses, this thickness range can be realized by dilution AZ® 1518 (PGMEA = AZ® EBR Solvent):
AZ® 1515 (nominal 1.5 μm at 4000 rpm): 100 g AZ® 1518 + 5.16 g PGMEA
AZ® 1512 (nominal 1.2 μm at 4000 rpm): 100 g AZ® 1518 + 14.67 g PGMEA
AZ® 1505 (nominal 0.5 μm at 4000 rpm): 100 g AZ® 1518 + 70.3 g PGMEA
AZ® 1514 H covers the thickness range from 1.0 to 2.0 μm.
AZ® 1512 HS covers the thickness range from 1.0 to 2.0 μm. Besides an improved adhesion on many substrate materials, AZ® 1512 HS has a significantly improved photospeed and contrast due to its high photoactive compound concentration.
For further information refer Photoresist
AZ1500-series.pdf
Development
AZ® 351B 1 : 4 or AZ® 726 MIF recommended; AZ® 400K 1 : 4 or AZ® 326 MIF pos- sible
®AZ, the AZ logo, BARLi , Aquatar and
Kallista are registered trademarks of AZ Electronic
Materials.
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