|
Photoresists, Ancillaries,
Etchants, Solvents, and Technical Support
for all Stages of
MicroStructuring and
Lithography
|
|
|
Photoresists
Developers
Remover/Stripper
Thinner/EBR
Adhesion Promotion
Etchants
Etching Mixtures
Solvents
UV - Filter
|
AZ 6600 Series Photoresists
AZ 6600 Series
This family was launched in 1992 and represents the 3rd
generation of general purpose resists. It combines the
good adhesion of AZ® 1500 HS-series with high thermal
stability as required for modern dry-etch processes.
Today it is one of the most popular resist-series for
general applications. It is used for broadband-, g-line-
and i-line-exposure as well.
Resolution goes down to below 1 µm, design for a small
mask-bias of 0.15 µm makes them useful where existing
mask-sets shall be used together with a modern
photoresist to meet today’s etching and implant
processes. This family consists of a wide range of
viscosities to cover different demands:
AZ 6612, AZ 6612, AZ 6624 and AZ 6632
AZ® 6612, AZ® 6612, AZ® 6624 and AZ® 6632 are available as
standard types.
For further information refer Photoresist
AZ 6600-series.pdf
®AZ, the AZ logo, BARLi , Aquatar and
Kallista are registered trademarks of AZ Electronic
Materials.
|
|
