AZ 9260 Photoresist
AZ 9260 thick film photoresist
Film thickness: 3 ... 20 μm, up to 150 μm by multiple coating (with restrictions)
UV-sensitivity: i- and h-line (310 - 410 nm), broadband or monochromatic
Sales volumes: 250 ml, 500 ml, 1000 ml, 2.5 L, and 3.78 L
General Information
Compared to the AZ® 4500 series, the AZ® 9200 resists have a lower optical absorp- tion. This simplifies the exposure of (also very) thick resist films. Therefore – in com- bination with the missing g-line sensitivity – the AZ® 9200 series needs a higher exposure time under broadband condition, and reveals a lower development rate as compared to AZ® 4500 films processed under the same conditions.
For lower resist film thicknesses we recommend a dilution with PGMEA = ‘AZ® EBR Solvent’. The following resist film thicknesses refer to 4000 rpm under
standard conditions:
4.0 μm: 100 g AZ® 9260
3.0 μm: 100 g AZ® 9260
2.0 μm: 100 g AZ® 9260
1.5 μm: 100 g AZ® 9260
1.0 μm: 100 g AZ® 9260
Development
+ 13 g PGMEA + 23 g PGMEA + 42 g PGMEA + 55 g PGMEA + 88 g PGMEA
AZ® 400K1:4orAZ® 726MIFrec- ommended. In case of very thick re- sist films, a rather strong developer concentration such as AZ® 400K 1 : 3.5 ... 1 : 3.0 might be reasonable for required short development times.
For further information refer Photoresist
AZ 9260.pdf
®AZ, the AZ logo, BARLi , Aquatar and
Kallista are registered trademarks of AZ Electronic
Materials.
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