AZ MiR 701 Photoresist
AZ MIR 701
Product Description AZ® MiR™ Series photoresists are
fast, cost effective resists designed for replacement of
older mid-range production resists. The AZ® MiR series
photoresists work well in both surfactated and
non-surfactated TMAH developers using standard process
conditions. AZ® MiR 701 photoresist is designed for
production use at 0.30µm to 0.40µm CDs.
For further information refer Photoresist
AZ MIR_701.pdf
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Materials.
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