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TI 35E Photoresist

TI 35E 
TI 35E is a image reversal photoresist for wet-etching.

Film thickness: 2.5 .. 4.0 µm 
UV-sensitivity: i, h, and g-line (310 - 440 µm), broadband and monochromatic
Sales volumes: 250 ml, 500 ml, 1.000 ml, 2500 ml und 5 Liter

General Information
TI 35E is specially designed for the application in the so called "image reversal technology" for wet chemical treatment:

  • Etching of Si1-xNx deposited at 400 °C with PECVD
  • Etching of stoichiometric SiN in BHF (12.5% HF)
  • Etching of thick thermal SiO2 with 20% HF, no visible degradation of resist after 10 min
  • Possible etching in HF conc. (50%) for several minutes
  • Direct mesa grooving without SiO2 masking

Developer
AZ 400K and AZ 826


For further information Photoresist TI 35E

 

  

  

 

 


®AZ, the AZ logo, BARLi , Aquatar and Kallista are registered trademarks of AZ Electronic Materials.

Overview
Sales volumes
 

Positive Thin  
AZ® 111 XFS 
AZ® 1505 
AZ® 1512HS 
AZ® 1514H 
AZ® 1518 
AZ® 6612 
AZ® 6624 
AZ® 6632
AZ® MiR 701
AZ® ECI 3027

Positive Thick 
AZ® 4533
AZ® 4562 
AZ® 9260
AZ® 40XT
 

Negative 
AZ®nLof 2070
AZ® 15nXT 
AZ® 125nXT 

Image Reversal/Lift-off
AZ® 5214E 
TI 35E 
TI 35ES 
TI Plating 
TI xLift  
AZ®nLof 2070
 

Deep-UV Photo Resist
AZ® TX 1311
 

Other Resists
AZ® 520D 
AZ®4999 
TI Spray 
PL 177 
AZ® Aquatar
AZ® Barli II
 

Other Resist Types  
Electroplating Resists
e-Beam Resists
Protective Coating

Spray Coating Resist
P. Circuit Board Resist
Antireflective Coating

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