Photoresists, Ancillaries, Etchants, Solvents, and Technical Support
for all Stages of MicroStructuring and Lithography

 

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Photoresists
Developers
Remover/Stripper
Thinner/EBR
Adhesion Promotion
Etchants
Etching Mixtures
Solvents 

Photoresists

Positive Thin
Positive Thick
Image Reversal
Other Resist Types

AZ® and MicroChemicals® TI resists cover the thickness range from 0.5 to 50 µm.

MicroChemicals distributes original AZ® photoresists in both original trading units as well as smaller sales units of 250ml and 1.000 ml, refilled in bottles under cleanroom conditions (class 10).These resists cover a huge thickness range for almost all lithographic applications based on positive and negative tone resists.

MicroChemicals develops, produces and distributes TI photoresists for special applications such as lift-off and plasma-, wet chemical etching. The following pages give a survey of both AZ® and TI photoresist families. The individual advantages are pointed out individually.
 
For general introduction refer INTRODUCTION.pdf

Overview
Sales volumes
 

Positive Thin  
AZ® 111 XFS 
AZ® 1505 
AZ® 1512HS 
AZ® 1514H 
AZ® 1518 
AZ® 6612 
AZ® 6624 
AZ® 6632
AZ® MiR 701
AZ® ECI 3027

Positive Thick 
AZ® 4533
AZ® 4562 
AZ® 9260 
 

Image Reversal/Lift-off
AZ® 5214E 
TI 35E 
TI 35ES 
TI Plating 
TI xLift  
AZ®nLof 2070
 

Other Resists
AZ® 520D 
AZ®4999 
TI Spray 
PL 177 
AZ® Aquatar
AZ® Barli II
 

Other Resist Types  
Negative Resist 
Protective Coating
Spray Coating Resist
P. Circuit Board Resist
Antireflective Coating

Product Data Sheets
Safety Data Sheets
Brochure 2008/2009
Application Notes

Tech Support Form
Interactive Support
Litho-Forum

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Questionnaire

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