MIF Developers

First of all, it has to be checked wehether the developer has to be metal ion free (MIF), or alternatively metal ion containing (MIC).

For further informations please visit our summary page developers.

AZ® 326 (MIF)

AZ® 326 (MIF) is 2.38 % TMAH (TetraMethylAmmoniumHydroxide) in H2O.

For further information please refer to AZ MIF_Developer.pdf

 

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here: application notes.

AZ® 726 (MIF)

AZ® 726 (MIF) is 2.38 % TMAH in  H2O with surfactants added for fast and homogeneous substrate wetting.

For further information please refer to AZ MIF_Developer.pdf

 

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here: application notes.

AZ® 826 (MIF)

AZ® 826 (MIF) is 2.38 % TMAH in  H2O with surfactants added for fast and homogeneous substrate wetting, and further additives for removal of resist residuals occasionally remaining after development. These additives, however, slightly increase the dark erosion.

For further information please refer to AZ MIF_Developer.pdf

 

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here: application notes.