MIC Developers

First of all, it has to be checked wehether the developer has to be metal ion free (MIF), or alternatively metal ion containing (MIC).

For further informations please visit our summary page developers.

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here: application notes.

AZ® Developer (MIC)

AZ® Developer is optimized for minimum Al attack. It is an odourless,aqueous, inorganic, alkaline solution, which is compatible with batch andin-line developing processes. It is typically applied 1:1 diluted in DI-H2Ofor high contrast, or undiluted for a high development rate. The darkerosion of AZ® Developer is slightly higher as compared to other developers.AZ® Developer can be used in combination with most families of AZPhotoresists (i.e. AZ 1500, AZ 6600 and AZ 4500). AZ® Developer displays the lowest aluminium etch rate of all AZDeveoper-types and is ideal for metal levels.

For further information please refer to AZ® Developer (MIC).pdf

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here: application notes.

AZ® 351B Developer (MIC)

AZ® 351B (MIC) is based on buffered NaOH and typically used in a 1:3 to 1:4 dilution (1 part of concentrate and 4 parts of DI-water) and can be used especially for our thinner resist types, such as AZ1500 Series resists.

For further information please refer to AZ® 351B Developer (MIC).pdf

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here: application notes.

AZ® 400K Developer (MIC)

AZ® 400K (MIC) is based on buffered KOH and typically used in a 1:3 to 1:4dilution (1 part of concentrate and 4 parts of DI-water) and can be usedespecially for our thicker resist types, such as AZ 4562, AZ 9260, and AZ40XT.

For further information please refer to AZ® 400K Developer (MIC).pdf
and additional information Info AZ 400K Developer

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here: application notes.

AZ® 303 Developer (MIC)

AZ® 303 (MIC) is based on KOH and NaOH and designed for the resist AZ® 111 XFS, it can be used also for AZ nLof 20XX series resists.

For further information refer AZ® 303 Developer (MIC).pdf

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here: application notes.

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