BOE (Buffered Oxide Etch) and BOE with Surfactant
Buffered Oxide Etch, BOE 7:1
Buffered Oxide Etch, BOE 7:1 with Surfactant
We supply buffered hydrofluoric acid = BOE 7:1 (HF : NH4F = 12.5 : 87.5%) in VLSI-quality, which is the usual purity grades applied in semiconductor processing and micro-electronics. A new type of BOE 7:1 in our portfolio is the Buffered Oxide Etch with Surfactant.
Used for etching of SiO2. Due to the higher PH value in contrast to unbuffered HF it gives better results in combination with photo resists.
The etch rate on SiO2 is (depending on temperature and SiO2 morphology) in the range of 70-90 nm per minute.
The specifications of our BOE 7:1 are listed here:
Futher information: Wet chemical etching
Typical Fields of Application of Buffered Hydrofluoric Acid
BOE is mainly used for etching glasses, quartz and SiO2 films.
Technical Data Sheet (TDS)
For further information please refer to the technical data sheet of the BOE:
Lithography Application Notes
Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here: application notes.
Sales Volumes, Shipping and Pricing
Available Sales Units:
Bottles á 2.5 L (also single bottles)
30 or 200 L drums on request
Our typical lead time is 1-3 working days within Germany, lead times to other countries on request. On demand, in urgent cases our etchants can be shipped within 24 hours to a destination inside Germany.
Please send us your request.
phone: +49 (0)731 977 343 0
fax: +49 (0)731 977 343 29