Antireflective Coating

Phase out of AZ® Aquatar

Dear valued Customers,

we want to inform you, that the product AZ® Aquatar will be discontinued by the end of 2018. The good news are, that there is an alternative product produced according to a different recipe that is quite similar to AZ® Aquatar and which can be in principle regarded as a plug-in substitute. It is called AZ® Aquaristi III 45 from which you can order of course a free sample for your evaluation tests.

> AZ® Aquaristi III 45 (MSDS)
> AZ® Aquaristi III 45 (comparison study)

Thank's for understanding!

 

 

AZ Aquatar

(TARC)

General Information

AZ® Aquatar® is a top layer anti-reflective coating for use with g- and i-line. AQUATAR® acts like an optical coating at the interface photoresist/air and improves image contrast.
Multiple reflections within the photoresist are also suppressed, the result is generally a reduction of the amplitude of the swing curve to 1/3rd. Application is very simple: it is just spun on top of the photoresist, no additional bake cycle is required and the standard development cycle removes it.
This simple process reduces linewidth variation over topography significantly, however does not suppress reflective notching.

Technical Data Sheet:

For further information please refer to the technical data sheet:
> AZ Aquatar (TDS)
>
AZ Aquatar (Info)

 

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here:
> application notes

AZ Barli

(BARC)

General Information

AZ® BARLi® - II is a bottom antireflective layer coating for use on highly reflective surfaces in the semiconductor industry. It is designed to work with positive photoresists and is optimized for i-line exposure tools. Upon completion of the lithographic process, AZ® BARLi® - II is patterned in a dry-etch process.

AZ® BARLi® -II coating material is formulated in photoresist-compatible solvents to simplify the EBR process and to be both environmental and user friendly. We recommend AZ® EBR 70/30 for best performance.

AZ® BARLi® - II is tailor-made to yield the near-optimum values for refractive indices (n and k) for i-line lithography, which ensures minimum reflectivity and maximum swing reduction for photoresist layers.
Composed of highly absorptive polymer-bound dyes, this material provides excellent coating uniformity and step coverage.

AZ® BARLi® - II shows high etch selectivity (comparable to AZ® BARLi® ) and high thermal stability up to 230°C. It does not show intermixing with photoresist.

AZ® BARLi® - II is available in two thickness grades, 900 A and 2000 A, in order to provide optimum film thickness for the first and the second swing minimum respectively at about 3000 rpm spin speed.

Technical Data Sheet:

For further information please refer to the technical data sheet:
> AZ Barli II (TDS)
>
AZ® Barli®- II (Info)
>
information of processing

 

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here:
> application notes

Sales Volumes, Purity Grade and Shipping

Our typical lead time is 1-3 working days within Germany, lead times to other countries on request. On demand, in urgent cases our etchants can be shipped within 24 hours to a destination inside Germany.

Please send us your request.

e-mail: sales(at)microchemicals.com
phone: +49 (0)731 977 343 0
fax: +49 (0)731 977 343 29

Thank you very much for your interest!

®AZ, the AZ Logo, BARLi and Aquatar are registered trademarks of Merck Performance Materials GmbH.