AZ® 5209 E
Thickness Range and Exposure
Film thickness: 0.6 … 2.6 µm
UV-sensitivity: g-line, i-line, broadband
Sales Volumes: 3,78 L
The AZ 5209 E is specially designed for the application in the so called “image reversal technology”, it is intended for lift-off techniques which call for a negative side wall profile. It is characterized by an improved adhesion, high thermal stability and it can be developed in a variety of metal ion free and inorganic developers (with and without surfactants).
Technical Datasheet (TDS):
For further information please refer to Technical Datasheet AZ 5209E.
Lithography Application Notes
Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here: application notes.