AZ® 5209 E

Thickness Range and Exposure

Film thickness: 0.6 … 2.6 µm
UV-sensitivity: g-line, i-line, broadband
Sales Volumes: 3,78 L

General Information

The AZ 5209 E is specially designed for the application in the so called “image reversal technology”, it is intended for lift-off techniques which call for a negative side wall profile. It is characterized by an improved adhesion, high thermal stability and it can be developed in a variety of metal ion free and inorganic developers (with and without surfactants).

Developement

AZ®726 MIF or AZ®351B 1:4 recommended
AZ®326 MIF or AZ®400K 1:4 possible

Technical Datasheet (TDS):

For further information please refer to Technical Datasheet AZ 5209E.

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here: application notes.