AZ® MIR 701 - High Resolution and Temperature Stability
Available in two Versions:
AZ MIR 701 14CP
AZ MIR 701 29CP
Thickness Range and Exposure
AZ MIR 701 14CP: 900 nm at 4.000 rpm, few 100 nm by dilution
AZ MIR 701 29CP: 1.6 µm at 4.000 rpm
UV-sensitivity: i-, h-, g-line (310 - 440 nm), broadband or monochromatic
Sales volumes: on request
AZ® MIR 701 is a thermally stable (softening point>130°C), high resolution photo resist optimized for dry etching of sub-µm structures. For even higher resolutions applying e. g. laser interference lithography, AZ® MIR 701 can be further diluted to 500 nm and below.
Technical Data Sheet (TDS)
For further information refer to the technical data sheet of the AZ MIR 701 : TDS_AZ MIR_701
Lithography Application Notes
Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here: application notes.