AZ P4000 Positive Resists: AZ P4110, AZ P4330, AZ 4903, AZ P4620

General Information

The AZ P4000 positive resist series with its members AZ P4110, AZ P4330, AZ P4620 and AZ P4903 have two main characteristics:

  • An improved adhesion to all common substrates for a higher stability for e. g. wet etching or plating
  • A lower photo active compound concentration which allows the application of thick and very thick resist films (approx. 3 - 30 µm)
  • Steep wall profiles, high aspect ratios
  • Sensitive to g-, h-, and i-line
  • Recommended developers: KOH-based (e. g. AZ 400K) or TMAH-based (e. g. AZ 826 MIF)
  • Standard strippers (e. g. AZ 100 Remover, TechniStrip P1316)
  • Thinner and edge bead remover: AZ EBR Solvent = PGMEA

AZ P4110

Resist fim thickness range: Approx. 2 - 5 µm. Sales units: Galons (small sales volumes such as 250 ml, 500 ml or 1000 ml on request)

AZ P4330

Resist fim thickness range: Approx. 3 - 8 µm. Sales units: Galons (small sales volumes such as 250 ml, 500 ml or 1000 ml on request)

AZ P4620

Resist fim thickness range: Approx. 6 - 20 µm. Sales units: 250 ml, 500 ml or 1000 ml, galons (3.78 L)

AZ P4903

Resist fim thickness range: Approx. 8 - 30 µm. Sales units: Galons (small sales volumes such as 250 ml, 500 ml or 1000 ml on request)

Maximum Aspect Ratio for 5 - 20 µm Resist Film Thickness required?

For this purpose, we recommend our AZ 9260

> 30 µm Resist Film Thickness required?

For this purpose, we recommend our chemically amplified AZ 40XT

 

 

Development

AZ® 400K 1 : 4 or AZ® 826 MIF recommended

 

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here: application notes.