PL 177 Photoresist
Thickness Range and Exposure
Film thickness: 1 ... 10 μm (depending on the deposition methot)
UV-sensitivity: i-, h-, g-line (310 - 440 nm), broadband/monochromatic
Sales volumes: 250 ml, 500 ml, 1.000 ml, 2500 ml and 5 Liter
AZ® PL 177 is a positive tone liquid photoresist for the application in various coating techniques, especially for printed circuit boards manufacturing. AZ® PL 177 can be used in all those places, where layouts are directly to be copied onto and subsequently transferred into a substrate by
The essential features of AZ® PL 177 include:
- high resolution potential
- good drying behaviour
- aqueous-alkaline processability
- halogen free coating solvent
- possibility of multiple exposure (selective plating process) light or bright day light should be avoided
- storability of coated substrates
- blue coloured for easy inspection
PL 177 can be applied by dip coating. By dilution with suitable solvents PL 177 can be adjusted to also meet the viscosity and drying requirements of other coating techniques (spray coating, roller coating, spin coating). PL 177 is resistant towards acidic and ammoniacal etchants as well as acidic and neutral plating baths.
The final removal of the temporary resist layer, the stripping, is done with low concentrated bases. PL 177 is used in the manufacturing of printed circuit boards, multilayer inner flexible boards and in chemical milling.
AZ® Developer also possible are AZ® 400K 1:4 or AZ® 826MIF as well as simple NaOH and KOH solutions.
For further information please refer to Photoresist AZ PL 177.pdf
Lithography Application Notes
Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here: application notes.