Spray Coating Photoresists

AZ® 4999

Thickness Range and Exposure

Film thickness: 0.5 ... 20 µm (depending on spray coating conditions)
UV-sensitivity: i-, h-, g-line (310-440nm)
Sales volumes: 250ml, 500ml, 1L, 2.5L und 5 Liter

General Information

AZ® 4999 is a spray coating dedicated highly transparent photoresist tailored to excel on special spray coating equipment (e.g. SUSS Delta AltaSpray) where it provides defect free and conformal coatings on devices with severe topography. 

Thick (several to several tens of microns) and uniform resist coatings are obtained on topography such as V-grooves and trenches with optimum coverage of sharp edges.

There is no accumulation of resist in trenches. The use of AZ® 4999 photoresist enables high reproducibility in volume production applications.

Developer

AZ® 400K Developer, AZ® 826 MIF Developer recommended;
AZ® 351B possible

 

For further information refer Photoresist AZ 4999.pdf

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here: application notes.

TI Spray

Thickness Range and Exposure

Film thickness: 0.5 ... 5 µm
UV-sensitivity: i-, h-, g-line (310-440nm)
Sales volumes: 250ml, 500ml, 1L, 2.5L und 5 Liter

General Information

The TI Spray Photoresist is specially designed for the application in the so called “image reversal technology” for:

  • subsequent lift-off of deposited layers
  • wet chemical treatment in HF containing etching solutions
  • direct mesa grooving

The viscosity enables a direct use in spray coating equipment for a target thickness of 1 to 10 µm. The typical aspect ratio of the structured features achievable is in the range of 1.6 .. 2.0. 

This technical data sheet intends to give you a guide-line for process parameters for various applications. However, the optimum values for e.g. exposure dose, or development depend on the individual equipment and need to be adjusted on each individual demand.

Developer

AZ® 400K Developer, AZ® 826 MIF Developer recommended;
AZ® 351B possible


 
For further information please refer to Photoresist MicroChemicals TI Spray

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here: application notes.

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