TI Spray
Thickness Range and Exposure
Film thickness: 0.5 ... 5 µm
UV-sensitivity: i-, h-, g-line (310-440nm)
Sales volumes: 250ml, 500ml, 1.000 ml, 2.5L und 5 Liter
General Information
The TI Spray Photoresist is specially designed for the application in the so called “image reversal technology” for:
- subsequent lift-off of deposited layers
- wet chemical treatment in HF containing etching solutions
- direct mesa grooving
The viscosity enables a direct use in spray coating equipment for a target thickness of 1 to 10 µm. The typical aspect ratio of the structured features achievable is in the range of 1.6 .. 2.0.
This technical data sheet intends to give you a guide-line for process parameters for various applications. However, the optimum values for e.g. exposure dose, or development depend on the individual equipment and need to be adjusted on each individual demand.
Developer
AZ® 400K Developer, AZ® 826 MIF Developer recommended;
AZ® 351B possible
Technical Data Sheet:
For further information please refer to the technical data sheet:
> TI Spray (TDS)