PGMEA = EBR Solvent (1-methoxy-2-propyl-acetate)
Available Sales Units of PGMEA
- Bottles á 1 L and 5 L (also single bottles)
- 200 L drums on request
Typical Fields of Application of PGMEA
PGMEA is the solvent/thinner of almost all AZ® and TI photoresists due to its low vapor pressure and its suppression of particle formation in the (further diluted) resist. Additionally, PGMEA is often used for edge bead removal, since its low vapor pressure prevents further thinning of the coated resist film.
For further information refer EBR Solvent.pdf