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AZ 100 Remover

AZ 100 Remover
AZ 100 Remover is based on solvent and amine. AZ 100 Remover is used for photoresist stripping with low attack to aluminium. Low hazard is achieved by avoiding use of ethanol amine.
Low evaporation rate allows for use at elevated temperatures (up to 80°C), high efficiency (>3000 wafer per litre) helps saving costs. Where attack to aluminium is of no concern, it may even be diluted with water.
  
For further information refer AZ 100 Remover.pdf

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