MIF Developers

First of all, it has to be checked wehether the developer has to be metal ion free (MIF), or alternatively metal ion containing (MIC).

For further informations please visit our summary page:
> Developers

AZ® 326 MIF

AZ® 326 MIF is 2.38 % TMAH (TetraMethylAmmoniumHydroxide) in H2O.

> AZ MIF_Developer (TDS)

AZ® 726 MIF

AZ® 726 MIF is 2.38 % TMAH in  H2O with surfactants added for fast and homogeneous substrate wetting.

> AZ MIF_Developer (TDS)

AZ® 826 MIF

[no longer available]

AZ® 826 MIF is 2.38 % TMAH in  H2O with surfactants added for fast and homogeneous substrate wetting, and further additives for removal of resist residuals occasionally remaining after development. These additives, however, slightly increase the dark erosion.

> AZ MIF_Developer (TDS)

AZ® 2026 MIF

AZ® 2026 MIF is 2.38 % TMAH in  H2O with surfactants added for fast and homogeneous substrate wetting, and further additives for removal of resist residuals occasionally remaining after development. These additives, however, slightly increase the dark erosion.

> AZ MIF_Developer (TDS)
>
TDS AZ 2026 MIF

AZ® 2033 MIF

AZ® 2033 MIF is 3.00 % TMAH in H2O with surfactants added for fast and homogeneous substrate wetting, and further additives for removal of resist residuals (residues in certain lacquer families), but at the cost of a higher dark removal. Compared to the AZ® 2026 MIF, the normality is not 0.26 but 0.33. Thus the development rate is higher with the AZ® 2033 MIF.

> AZ MIF Developer (TDS)
>
TDS AZ 2033 MIF

Sales Volumes, Purity Grade and Shipping

Available Sales Units:

  • Sales volumes: 5 L bottles (1 PU = 4 x 5 liters)
  • 30 L, 200 L drums on request

Our typical lead time is 1-3 working days within Germany, lead times to other countries on request. On demand, in urgent cases our etchants can be shipped within 24 hours to a destination inside Germany.

Please send us your request.

e-mail: sales(at)microchemicals.com
phone: +49 (0)731 977 343 0
fax: +49 (0)731 977 343 29

Thank you very much for your interest!