First of all, it has to be checked wehether the developer has to be metal ion free (MIF), or alternatively metal ion containing (MIC).
For further informations please visit our summary page:
AZ® Developer MIC
AZ® Developer is optimized for minimum Al attack. It is an odourless,aqueous, inorganic, alkaline solution, which is compatible with batch andin-line developing processes. It is typically applied 1:1 diluted in DI-H2Ofor high contrast, or undiluted for a high development rate. The darkerosion of AZ® Developer is slightly higher as compared to other developers. AZ® Developer can be used in combination with most families of AZPhotoresists (i.e. AZ® 1500, AZ® 6600 and AZ® 4500). AZ® Developer displays the lowest aluminium etch rate of all AZ® Deveoper-types and is ideal for metal levels.
AZ® 351B Developer MIC
AZ® 351B MIC is based on buffered NaOH and typically used in a 1:3 to 1:4 dilution (1 part of concentrate and 4 parts of DI-water) and can be used especially for our thinner resist types, such as AZ® 1500 Series resists.
AZ® 400K Developer MIC
AZ® 400K (MIC) is based on buffered KOH and typically used in a 1:3 to 1:4dilution (1 part of concentrate and 4 parts of DI-water) and can be usedespecially for our thicker resist types, such as AZ® 4562, AZ® 9260, and AZ® 40XT.
AZ® 303 Developer MIC
AZ® 303 (MIC) is based on KOH and NaOH and designed for the resist AZ® 111 XFS, it can be used also for AZ® nLof 20XX series resists.
Sales Volumes, Purity Grade and Shipping
Available Sales Units:
- Sales volumes: 5 L bottles (1 PU = 4 x 5 liters)
- 30 L, 200 L drums on request
Our typical lead time is 1-3 working days within Germany, lead times to other countries on request. On demand, in urgent cases our etchants can be shipped within 24 hours to a destination inside Germany.
Please send us your request.
phone: +49 (0)731 977 343 0
fax: +49 (0)731 977 343 29