BOE and BOE with Surfactant

Buffered Oxide Etch

General Information

Product Types:

Buffered Oxide Etch, BOE 7:1
Buffered Oxide Etch, BOE 7:1 with Surfactant

We supply buffered hydrofluoric acid = BOE 7:1 (HF : NH4F = 12.5 : 87.5%) in VLSI-quality, which is the usual purity grades applied in semiconductor processing and micro-electronics. A new type of BOE 7:1 in our portfolio is the Buffered Oxide Etch with Surfactant.

Used for etching of SiO2. Due to the higher PH value in contrast to unbuffered HF it gives better results in combination with photo resists.
The etch rate on SiO2 is (depending on temperature and SiO2 morphology) in the range of 70-90 nm per minute.

Typical Fields of Application of Buffered Hydrofluoric Acid

BOE is mainly used for etching glasses, quartz and SiO2 films.

Technical Data Sheet:

For further information please refer to the technical data sheet:
> Buffered Oxide Etch (SPEC)
> Buffered Oxide Etch with Surfactant (SPEC)
> Wet Etching
> Wet etching metals

Please be advised that some data sheets are password protected and you need to sign up to get the account data.   > Sign up

Sales Volumes, Purity Grade and Shipping

Available Sales Units:

  • 2,5L bottles (1 PU = 6 x 2,5L or single bottles)
  • 25L or 60L drums on request

Available Purity Grade:

  • VLSI

Our typical lead time is 1-3 working days within Germany, lead times to other countries on request. On demand, in urgent cases our etchants can be shipped within 24 hours to a destination inside Germany.

Please send us your request.

e-mail: sales(at)
phone: +49 (0)731 977 343 0
fax: +49 (0)731 977 343 29

Thank you very much for your interest!

®AZ, the AZ Logo, BARLi and Aquatar are registered trademarks of Merck Performance Materials GmbH.