AZ Barli

General Information

AZ^_® BARLi^_® - II is a bottom antireflective layer coating for use on highly reflective surfaces in the semiconductor industry. It is designed to work with positive photoresists and is optimized for i-line exposure tools. Upon completion of the lithographic process, AZ^_® BARLi^_® - II is patterned in a dry-etch process.

AZ^_® BARLi^_® -II coating material is formulated in photoresist-compatible solvents to simplify the EBR process and to be both environmental and user friendly. We recommend AZ^_® EBR 70/30 for best performance.

AZ^_® BARLi^_® - II is tailor-made to yield the near-optimum values for refractive indices (n and k) for i-line lithography, which ensures minimum reflectivity and maximum swing reduction for photoresist layers.
Composed of highly absorptive polymer-bound dyes, this material provides excellent coating uniformity and step coverage.

AZ^_® BARLi^_® - II shows high etch selectivity (comparable to AZ^_® BARLi^_® ) and high thermal stability up to 230°C. It does not show intermixing with photoresist.

AZ^_® BARLi^_® - II is available in two thickness grades, 900 A and 2000 A, in order to provide optimum film thickness for the first and the second swing minimum respectively at about 3000 rpm spin speed.

Technical Data Sheet:

For further information please refer to the technical data sheet:
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