AZ® 10XT

Thick Resists for High Resolution

! ALTERNATIVE PRODUCT FOR AZ 9260 !

This week (KW34) we were informed by the manufacturer Merck, whose distributor we are, that due to an ingredient (based on PFOS surfactants) the resists AZ 9260 and AZ 9245 are now no longer available and may no longer be placed on the market, according to which there are no salable stocks remaining.

You can find the official letter from the manufacturer together with an updated MSDS below. However, with the AZ 10 XT there exists a PFOS-free alternative, otherwise - to a large extent - identical to the AZ 9260, which should allow you to continue your previous processes with the same parameters and the same results.

We will gladly send you samples on request.
Please contact us: sales(at)microchemicals.de

Thank you for understanding!

> Letter
> AZ 10XT vs. AZ 9260

> TDS AZ 10XT

> MSDS AZ 9260
> MSDS AZ 9245
> MSDS AZ 10XT (520 CP)
> MSDS AZ 10XT (220 CP)

Resist-Types, Thickness Range and Exposure

Types:
AZ® 10XT 520CP
: for film thickness 5 ... 20 µm
Sales volumes: 250 ml, 500 ml, 1000 ml, 2.5 L and 3.78 L

AZ® 10XT 220CP: for film thickness 4 ... 6 µm
UV-sensitivity: i- and h-line (310 - 410 nm), broadband or monochromatic
Sales volumes: 250 ml, 500 ml, 1000 ml, 2.5 L and 3.78 L

General Information

Compared to the AZ® 4500 series, the AZ® 10XT resists have a lower optical absorption. This simplifies the exposure of (also very) thick resist films. Therefore – in combination with the missing g-line sensitivity – the AZ® 10XT series needs a higherexposure time under broadband condition, and reveals a lower development rate ascompared to AZ® 4500 films processed under the same conditions.

For lower resist film thicknesses we recommend a dilution with PGMEA = ‘AZ® EBR Solvent’. The following resist filmthicknesses refer to 4000 rpm understandard conditions:

  • 4.0 µm:100 g AZ® 10XT + 13 g PGMEA
  • 3.0 µm:100 g AZ® 10XT+ 23 g PGMEA
  • 2.0 µm:100 g AZ® 10XT+ 42 g PGMEA
  • 1.5 µm:100 g AZ® 10XT+ 55 g PGMEA
  • 1.0 µm:100 g AZ® 10XT+ 88 g PGMEA

Development

AZ® 400K 1 : 4 or AZ® 726 MIF recommended. In case of very thick resist films, a rather strong developerconcentration such as AZ® 400K 1 : 3.5 ... 1 : 3.0 might be reasonable forrequired short development times.

Technical Data Sheet:

For further information please refer to the Technical Datasheet:
>
AZ® 10XT series (TDS)

 

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here:
> application notes

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