AZ® 3DT-102M-15

Reinforced positive photoresist

General Information

AZ 3DT-102M-15 is a chemically amplified positive tone photoresist with a very high aspect ratio. It is intended for the use as a mask for dry etching, ion implantation, RDL and electroplating applications (Cu-compatible). It can be used with i-line steppers as well as with conventional mask aligners. The AZ 3DT-102M-15 is intended for a thickness range of 8-20 µm.

Sales volumes: 3,78 L bottles (1 PU = 4 x 3,78 liters)

Technical Data Sheet:

For further information please refer to the Technical Datasheet:
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AZ® 3DT-102M-15 (TDS)

 

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here:
> application notes

Sales Volumes, Purity Grade and Shipping

Our typical lead time is 1-3 working days within Germany, lead times to other countries on request. On demand, in urgent cases our etchants can be shipped within 24 hours to a destination inside Germany.

Please send us your request.

e-mail: sales(at)microchemicals.com
phone: +49 (0)731 977 343 0
fax: +49 (0)731 977 343 29

Thank you very much for your interest!

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