AZ® LNR-003

Negative Resist also for lift-off applications

Thickness Range and Exposure

Film thickness: 3 ... 5.0 µm
UV-sensitivity:
Sales volumes:
250 ml, 500 ml, 1000 ml, 2,5 L and 5 L bottles

General Information

AZ® LNR-003 is a negativ resist for film thicknesses of approx. 3 - 5 µm, diluted down to 1 µm, which allows an adjustable and strong undercut (negative resist profile) even at small resist film thicknesses for also ambitious lift-off applications.

Development

We recommend the TMAH-based developers AZ® 326 MIF, AZ® 726 MIF or AZ® 2026 MIF. Other NaOH- or KOH-based developers are generally possible.

Stripper

We recommend the NMP-free removers TechniStrip NI555, or, in case of alkaline sensitive materials such as Aluminum, TechniStrip MLO07, which both can dissolve also crosslinked resist films.

Technical Data Sheet:

For further information please refer to the technical data sheet:
>
AZ® LNR-003 (TDS)

 

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here:
> application notes

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