AZ® LNR-003
Negative Resist also for lift-off applications
Thickness Range and Exposure
Film thickness: 3 ... 5.0 µm
UV-sensitivity:
Sales volumes: 250 ml, 500 ml, 1000 ml, 2,5 L and 5 L bottles
Shelf Life: Overview critical shelf lifes
General Information
AZ® LNR-003 is a negativ resist for film thicknesses of approx. 3 - 5 µm, diluted down to 1 µm, which allows an adjustable and strong undercut (negative resist profile) even at small resist film thicknesses for also ambitious lift-off applications.
Development
We recommend the TMAH-based developers AZ® 326 MIF, AZ® 726 MIF or AZ® 2026 MIF. Other NaOH- or KOH-based developers are generally possible.
Stripper
We recommend the NMP-free removers TechniStrip NI555, or, in case of alkaline sensitive materials such as Aluminum, TechniStrip MLO07, which both can dissolve also crosslinked resist films.
Technical Data Sheet:
For further information please refer to the technical data sheet:
> AZ LNR-003 (TDS)
> AZ LNR-003 (Additional Information)