AZ® MIR 701
High Resolution and Temperature Stability
Available in two Versions:
AZ MIR 701 14CP
AZ MIR 701 29CP
Thickness Range and Exposure
AZ MIR 701 14CP: 900 nm at 4.000 rpm, few 100 nm by dilution
AZ MIR 701 29CP: 1.6 µm at 4.000 rpm
UV-sensitivity: i-, h-, g-line (310 - 440 nm), broadband or monochromatic
Sales volumes: on request
General Information
AZ® MIR 701 is a thermally stable (softening point>130°C), high resolution photo resist optimized for dry etching of sub-µm structures. For even higher resolutions applying e. g. laser interference lithography, AZ® MIR 701 can be further diluted to 500 nm and below.
Development
AZ® 726 MIF or AZ® 351B 1 : 4 recommended;
AZ® 400K 1 : 4 or AZ® 326 MIF possible
Technical Data Sheet:
For further information please refer to the technical data sheet:
> AZ MIR_701 (TDS)
> AZ MIR 701 29CPS (Additional Information)
> AZ MIR 701 14CPS comparison studies
> AZ MIR 701 29CPS comparison studies
- 300 nm resist lines attained with the AZ® 701 MiR. Source: AZ® MiR 701 Product Data Sheet by AZ-EM®
- A 1.2 µm structure after 130°C hardbake. Source: AZ® MiR 701 Product Data Sheet by AZ-EM®