! AZ MIR 701 product change !
The manufacturer of the resist AZ 701 MIR (14 and 29 cPs) informed us on a scheduled product change notification concerning a PFOA related ingredient (PCN).
As the qualification document (each one for both viscosities) shows, the PFOA-free AZ 701 MIR does not reveal significant changes compared to the PFOA-containing AZ 701 MIR.
If you would like to test or qualify the PFOA-free AZ 701 MIR, we will be able to provide samples.
Please feel free to contact us!
AZ® MIR 701
High Resolution and Temperature Stability
Available in two Versions:
AZ MIR 701 14CP
AZ MIR 701 29CP
Thickness Range and Exposure
AZ MIR 701 14CP: 900 nm at 4.000 rpm, few 100 nm by dilution
AZ MIR 701 29CP: 1.6 µm at 4.000 rpm
UV-sensitivity: i-, h-, g-line (310 - 440 nm), broadband or monochromatic
Sales volumes: on request
AZ® MIR 701 is a thermally stable (softening point>130°C), high resolution photo resist optimized for dry etching of sub-µm structures. For even higher resolutions applying e. g. laser interference lithography, AZ® MIR 701 can be further diluted to 500 nm and below.
Technical Data Sheet:
Lithography Application Notes
Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here:
> application notes