Photoresist Stripper SVD

Quelle:"Metal-Lift-off" ©intelligent fluids®, intelligent-fluids.com

General Information

Photoresist-Stripper SVD (C-JV-DY) easily removes layers of photoresists (PR) from inorganic substrates such as silicon, glass and metals (e.g. copper). The smart intelligent fluids® (IF) mode of action is not based on aggressive dissolving processes as in the case of many conventional products. Instead, intelligent fluids® enable a gentle physical detaching even of  persistent layers, without damaging the substrate surface.

The Photoresist-Stripper SVD with its highly dynamic phase structures works in two steps:

● infiltration and fragmentation of the layer
● wrapping and removal of fragments

Negative-tone photoresists will be detached in larger fragments and can be filtered off. Positive-tone photoresists on the other hand will be incorporated into the fluid.

Advantages:

● water-based
● pH neutral to the skin (pH: 5.5 – 6.5)
● non-toxic, non-flammable
● safe-to-handle
● dermatologically tested - “excellent”
● readily biodegradable

Application

Apply IF directly and undiluted onto the surface. Compatible with singlewafer
and batchspray equipment. For wet-benches bath-agitation is necessary.

Temperature range: 30 °C to 70 °C, recommended 40 °C to 60 °C

Time for removal of PR is depending on type and lithography parameters.
It may vary from 1 min to 15 min, seldom longer.

Rinse surface properly with water, ethanol or isopropanol. For single-wafer-rinse higher spin-speed is recommended.

Remarks:

Photoresist-Stripper SVD should be used up within 6 months from the date of delivery. We can not guarantee a longer time for VLSI-quality after the product leaves our premises. However, a storage beyond this point does not necessarily mean that the product is unusable (shelf-life from date of manufacturing: one year).
This intelligent fluid® was not developed for cleaning processes such as post-
CMP clean or particle removal. The recommended application form is by batch- or single-wafer treatment, process parameters (tools, time, temperature) should be optimised individually in previous tests.

Important Note:

Store in original container only. IF should not be diluted. It could influence its properties and destroy its dynamic structures. IFs do not evaporate without residues, rinsing step is necessary. Please follow the instructions in the material safety data sheet for proper use, storage and disposal. The information given here are up to date and are subject to change in the future without prior notice.

Technical Data Sheet:

For further information please refer to the technical data sheet:
> Photoresist Stripper SVD (TDS)
> Photoresist Removal

Please be advised that some data sheets are password protected and you need to sign up to get the account data.   > Sign up

 

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here:
> application notes

Sales Volumes, Purity Grade and Shipping

Available Sales Units:

  • Bottles á 5 L (1 PU = 4 x 5 liters or single bottles)
  • 30 L or 200 L drums on request

Available Purity Grade:

  • MOS

Our typical lead time is 1-3 working days within Germany, lead times to other countries on request. On demand, in urgent cases our etchants can be shipped within 24 hours to a destination inside Germany.

Please send us your request.

e-mail: sales(at)microchemicals.com
phone: +49 (0)731 977 343 0
fax: +49 (0)731 977 343 29

Thank you very much for your interest!

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