Available Purity Grades of NMP
We supply NMP in ULSI-quality as typically used in the fields of semiconductor processing and micro-electronics. The specifications of both qualities are listed in the technical data sheet below.
Typical Fields of Application of NMP
NMP is a powerful lift-off medium due to its physical properties: NMP yields a low vapour pressure (no striation formation), strongly solves organic impurities as well as resists, keeps solved particles in solution, and can be heated up to 80°C due to its high boiling point. For the same reasons, NMP (pure or diluted in H2O) gives a very well-suited stripper for photoresists processed under harsh conditions.
Substitute for NMP?
Due to the toxicity of NMP and its position of the SVHC-list (REACH), the long-term availability of NMP can not be guaranteed. Therefore, we strongly recommend to consider alternative substances.
For non cross-linked resist films the AZ® 100 Remover, DMSO or other common organic solvents cab be used as stripper. If the resist film is crosslinked (e. g. by high temperature steps > 140°C, during plasma processes such as dry etching, or during ion implantation), we recommend the NMP-free, nontoxic TechniStrip P1316 or TechniStrip NI555 as remover.
Technical Data Sheet:
Lithography Application Notes
Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here:
> application notes
Sales Volumes, Purity Grade and Shipping
Available Sales Units:
- Bottles á 2.5 L (1 PU = 6 x 2,5 liters or single bottles)
- Bottles á 5 L (1 PU = 4 x 5 liters or single bottles)
- 30 L or 200 L drums on request
Available Purity Grade:
Our typical lead time is 1-3 working days within Germany, lead times to other countries on request. On demand, in urgent cases our etchants can be shipped within 24 hours to a destination inside Germany.
Please send us your request.
phone: +49 (0)731 977 343 0
fax: +49 (0)731 977 343 29