PGMEA = EBR Solvent
Typical Fields of Application of PGMEA
PGMEA is the solvent/thinner of almost all AZ® and TI photoresists due to its low vapor pressure and its suppression of particle formation in the (further diluted) resist. Additionally, PGMEA is often used for edge bead removal, since its low vapor pressure prevents further thinning of the coated resist film.
Technical Data Sheet:
Lithography Application Notes
Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here:
> application notes
Sales Volumes, Purity Grade and Shipping
Available Sales Units:
- Bottles á 5 L (1 PU = 4 x 5 liters or single bottles)
- 30 L or 200 L drums on request
Available Purity Grade:
Our typical lead time is 1-3 working days within Germany, lead times to other countries on request. On demand, in urgent cases our etchants can be shipped within 24 hours to a destination inside Germany.
Please send us your request.
phone: +49 (0)731 977 343 0
fax: +49 (0)731 977 343 29