AZ® P4000 Positive Resists

Outstanding Properties

The AZ_® P4000 positive resist series with its members AZ^_® P4110, AZ^_® P4330, AZ^_® P4620 and AZ^_® P4903 have two main characteristics:

• An improved adhesion to all common substrates for a higher stability for e. g. wet etching or plating
• A lower photo active compound concentration which allows the application of thick and very thick resist films (approx. 3 - 30 µm)
• Steep wall profiles, high aspect ratios
• Sensitive to g-, h-, and i-line
• Recommended developers: KOH-based (e. g. AZ^_® 400K) or TMAH-based (e. g. AZ^_® 826 MIF)
• Standard strippers (e. g. AZ^_® 100 Remover, TechniStrip P1316)
• Thinner and edge bead remover: AZ^_® EBR Solvent = PGMEA
  

AZ^_® P4110

Resist fim thickness range: Approx. 2 - 5 µm.
Sales volumes: 3.78 L (galone), smaller sales volumes on request

AZ^_® P4330

Resist fim thickness range: Approx. 3 - 8 µm.
Sales volumes: 3.78 L bottles (galone), smaller sales volumes on request

AZ_^® P4620

Resist fim thickness range: Approx. 6 - 20 µm.
Sales volumes: 250 ml, 500 ml, 1000 ml, 2,5 L and 3,78 L (galone)

AZ^_® P4903

Resist fim thickness range: Approx. 8 - 30 µm
Sales volumes: 3.78 L bottles (galone), smaller sales volumes on request

Maximum Aspect Ratio for 5 - 20 µm Resist Film Thickness required?

For this purpose, we recommend our AZ^_® 9260

> 30 µm Resist Film Thickness required?

For this purpose, we recommend our chemically amplified AZ^_® 40XT