AZ® 100 Remover

Universal Photoresist Stripper

General Information

AZ®100 Remover is based on solvent and amine. AZ®100 Remover is used for photoresist stripping with low attack to aluminium. Low hazard is achieved by the use of ethanol amine.

Low evaporation rate allows the use at elevated temperatures (up to 80°C), high efficiency (>3000 wafer per litre) helps saving costs. Where attack to aluminium is of no concern, it may even be diluted with water.

Sales volumes: 5L bottles

Compatibility

AZ®100 Remover is not compatible with AZ® nLof 2070 (AZ® nLof 2000 series) resists.

Technical Data Sheet:

For further information please refer to the technical data sheet:
> AZ® 100 Remover (TDS)
> Photoresist Removal

 

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here:
> application notes

Sales Volumes, Purity Grade and Shipping

Available Sales Units:

  • Sales volumes: 5 L bottles (1 PU = 4 x 5 liters)
  • 30 L, 200 L drums on request

Our typical lead time is 1-3 working days within Germany, lead times to other countries on request. On demand, in urgent cases our etchants can be shipped within 24 hours to a destination inside Germany.

Please send us your request.

e-mail: sales(at)microchemicals.com
phone: +49 (0)731 977 343 0
fax: +49 (0)731 977 343 29

Thank you very much for your interest!

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