TechniStrip® NI555

General Information

TechniStrip® NI555 was developed to address fast and complete photoresist film dissolution thus avoiding filter clogging and subsequent insoluble resin debris deposition encountered with most of standard stripping solutions.

Image taken from the technical documentation of TECHNIC INC.

A crosslinked AZ® 15 nXT film peels from the substrate in DMSO-, NMP- or TMAH-based strippers (left), while TechniStrip® NI555 completely dissolves the resist film after 20 minutes.

Sales volumes: 5L bottles

Compatibility

TechniStrip® NI555 is a powerful remover for Novolak-based negative resists and ultrathick positive resists such as

NOTE: Please note that the TechniStrip NI555 is not compatible with GaAs, which can cause problems in the application.

Technical Data Sheet:

For further information please refer to the technical data sheet:
> TechniStrip® NI555 (TDS)
>
TechniStrip® NI555 (SPEC)
> Photoresist Removal

 

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here:
> application notes

Sales Volumes, Purity Grade and Shipping

Available Sales Units:

  • Sales volumes: 5 L bottles (1 PU = 4 x 5 liters)
  • 30 L, 200 L drums on request

Our typical lead time is 1-3 working days within Germany, lead times to other countries on request. On demand, in urgent cases our etchants can be shipped within 24 hours to a destination inside Germany.

Please send us your request.

e-mail: sales(at)microchemicals.com
phone: +49 (0)731 977 343 0
fax: +49 (0)731 977 343 29

Thank you very much for your interest!

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