TechniStrip P1316

High Performance Removers

General Information

TechniStrip® P1316 is a powerful NMP-free remover for

  • Novolak-based positive resists such as all positive AZ® resists.
  • Epoxy-based resists
  • Polyimides, bonding glues
  • Dry films

At 75°C, TechniStrip® P1316 is able to dissolve – not only peel – even heavily crosslinked resists (e. g. by dry etching or ion implantation) from the substrate in few minutes.

TechniStrip® P1316 can be used in batch immersion and batch spray equipment, as well as in single wafers cleaning tools due to its high stripping efficiency.

Sales volumes: 5L bottles

Technical Data Sheet:

For further information please refer to the technical data sheet:
> TechniStrip® P1316 (TDS)
> TechniStrip® P1316 (SPEC)
> Photoresist Removal

 

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here:
> application notes

Sales Volumes, Purity Grade and Shipping

Available Sales Units:

  • Sales volumes: 5 L bottles (1 PU = 4 x 5 liters)
  • 30 L, 200 L drums on request

Our typical lead time is 1-3 working days within Germany, lead times to other countries on request. On demand, in urgent cases our etchants can be shipped within 24 hours to a destination inside Germany.

Please send us your request.

e-mail: sales(at)microchemicals.com
phone: +49 (0)731 977 343 0
fax: +49 (0)731 977 343 29

Thank you very much for your interest!

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