TechniStrip P1316

High Performance Removers

TechniStrip® P1316 is a powerful NMP-free remover for

  • Novolak-based positive resists such as all positive AZ® resists.
  • Epoxy-based resists
  • Polyimides, bonding glues
  • Dry films

At 75°C, TechniStrip® P1316 is able to dissolve – not only peel – even heavily crosslinked resists (e. g. by dry etching or ion implantation) from the substrate in few minutes.
TechniStrip® P1316 can be used in batch immersion and batch spray equipment, as well as in single wafers cleaning tools due to its high stripping efficiency.

For further information please refer to TechniStrip® P1316
additional information to TechniStrip® P1316

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here: application notes.

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