High Performance Removers
TechniStrip® P1316 is a powerful NMP-free remover for
- Novolak-based positive resists such as all positive AZ® resists.
- Epoxy-based resists
- Polyimides, bonding glues
- Dry films
At 75°C, TechniStrip® P1316 is able to dissolve – not only peel – even heavily crosslinked resists (e. g. by dry etching or ion implantation) from the substrate in few minutes.
TechniStrip® P1316 can be used in batch immersion and batch spray equipment, as well as in single wafers cleaning tools due to its high stripping efficiency.
Lithography Application Notes
Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here: application notes.