TechniStrip P1331 is a powerful NMP-free remover for
- Novolak-based positive resists such as all positive AZ® resists.
- Epoxy-based resists
- Polyimides, bonding glues
- Dry films
At 75°C, TechniStrip P1331 is able to dissolve – not only peel – even heavily crosslinked resists (e. g. by dry etching or ion implantation) from the substrate in few minutes.
TechniStrip P1331 can be used in batch immersion and batch spray equipment, as well as in single wafers cleaning tools due to its high stripping efficiency.