TechniStrip® P1331 is a powerful NMP-free remover for
- Novolak-based positive resists such as all positive AZ® resists.
- Epoxy-based resists
- Polyimides, bonding glues
- Dry films
At 75°C, TechniStrip® P1331 is able to dissolve – not only peel – even heavily crosslinked resists (e. g. by dry etching or ion implantation) from the substrate in few minutes.
TechniStrip® P1331 can be used in batch immersion and batch spray equipment, as well as in single wafers cleaning tools due to its high stripping efficiency.
Sales volumes: 5L bottles
Technical Data Sheet:
For further information please refer to the technical data sheet:
> TechniStrip® P1331 (TDS)
> TechniStrip® P1331 (SPEC)
> Photoresist Removal
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Sales Volumes, Purity Grade and Shipping
Available Sales Units:
- 5L bottles (1 PU = 4 x 5L or single bottles)
- 20L, 22L, 60L or 210L drums on request
Available Purity Grade:
Our typical lead time is 1-3 working days within Germany, lead times to other countries on request. On demand, in urgent cases our etchants can be shipped within 24 hours to a destination inside Germany.
Please send us your request.
phone: +49 (0)731 977 343 0
fax: +49 (0)731 977 343 29