TechniStrip™NF52

General Information

Highly effective remover for negative resists (liquid resists as well as dry films). The intrinsic nature of the additives and solvent make the blend totally compatible with metals used throughout the BEOL interconnects to WLP bumping applications.

Technical Data Sheet:

For further information please refer to the technical data sheet:
> TechniStrip™NF52 (TDS)
> TechniStrip™NF52 (SPEC)
> Photoresist Removal

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Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here:
> application notes

Sales Volumes, Purity Grade and Shipping

Available Sales Units:

  • Bottles á 5 L (1 PU = 4 x 5 liters or single bottles)
  • 30 L or 200 L drums on request

Available Purity Grade:

  • MOS

Our typical lead time is 1-3 working days within Germany, lead times to other countries on request. On demand, in urgent cases our etchants can be shipped within 24 hours to a destination inside Germany.

Please send us your request.

e-mail: sales(at)microchemicals.com
phone: +49 (0)731 977 343 0
fax: +49 (0)731 977 343 29

Thank you very much for your interest!

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