Bases
KOH Solution (44%)
Also used for anisotropic etching of silicon.
In dilution it can also be used for resist stripping, if the substrate is compatible.
Sales volumes: 2,5 L bottles (1 PU = 6 x 2,5 liters)
For further information please refer to the product page:
> KOH
TMAH (25%) Tetramethylammonium hydroxide
TMAH is mainly used for anisotropic silicon etching when metal ion free processing is required.
Sales volumes: 2,5 L bottles (1 PU = 6 x 2,5 liters)
For further information please refer to the product page:
> TMAH
Ammonia Solution (28%- 30%)
Mixed with H2O2, NH4OH is an ingredient of many etching mixtures for metals such as copper, silver or aluminium.
Sales volumes: 2,5 L bottles (1 PU = 6 x 2,5 liters)
For further information please refer to the product page:
> Ammonia Solution 28%-30 %
Sales Volumes, Purity Grade and Shipping
Available Sales Units:
- Bottles á 2.5 L (1 PU = 6 x 2,5 liters or single bottles)
- 5 L, 30 L or 200 L drums on request
Available Purity Grade:
- VLSI
- ULSI
Our typical lead time is 1-3 working days within Germany, lead times to other countries on request. On demand, in urgent cases our etchants can be shipped within 24 hours to a destination inside Germany.
Please send us your request.
e-mail: sales(at)microchemicals.com
phone: +49 (0)731 977 343 0
fax: +49 (0)731 977 343 29