Lithography Application Notes
Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here: application notes.
KOH Solution (44 %)
Also used for anisotropic etching of silicon.
In dilution it can also be used for resist stripping, if the substrate is compatible.
TMAH (25 %) Tetramethylammonium hydroxide
Available from 2.5 L sales volumes on in ULSI quality.
Sales Volumes, Shipping and Pricing
Available Sales Units of Buffered Hydrofluoric Acid
- Bottles á 2.5 L (also single bottles)
- 30 or 200 L drums on request
Our typical lead time is 1-3 working days within Germany, lead times to other countries on request. On demand, in urgent cases our etchants can be shipped within 24 hours to a destination inside Germany.
Please send us your request.
phone: +49 (0)731 977 343 0
fax: +49 (0)731 977 343 29
Thank you very much for your interest!