Bases

KOH Solution (44%)

Also used for anisotropic etching of silicon.
In dilution it can also be used for resist stripping, if the substrate is compatible.

Sales volumes: 2,5 L bottles (1 PU = 6 x 2,5 liters)

For further information please refer to the product page:
> KOH

TMAH (25%) Tetramethylammonium hydroxide

TMAH is mainly used for anisotropic silicon etching when metal ion free processing is required.

Sales volumes: 2,5 L bottles (1 PU = 6 x 2,5 liters)

For further information please refer to the product page:
> TMAH

Ammonia Solution (28%- 30%)

Mixed with H2O2, NH4OH is an ingredient of many etching mixtures for metals such as copper, silver or aluminium.

Sales volumes: 2,5 L bottles (1 PU = 6 x 2,5 liters)

For further information please refer to the product page:
> Ammonia Solution 28%-30 %

 

Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here:
> application notes

Sales Volumes, Purity Grade and Shipping

Available Sales Units:

  • Bottles á 2.5 L (1 PU = 6 x 2,5 liters or single bottles)
  • 5 L, 30 L or 200 L drums on request

Available Purity Grade:

  • VLSI
  • ULSI

Our typical lead time is 1-3 working days within Germany, lead times to other countries on request. On demand, in urgent cases our etchants can be shipped within 24 hours to a destination inside Germany.

Please send us your request.

e-mail: sales(at)microchemicals.com
phone: +49 (0)731 977 343 0
fax: +49 (0)731 977 343 29

Thank you very much for your interest!

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