Lithography Application Notes

Our list of application notes with litho-related theoretical and technical background on all stages of micro-structuring can be downloaded from here: application notes.

KOH Solution (44 %)

Also used for anisotropic etching of silicon.
In dilution it can also be used for resist stripping, if the substrate is compatible.

For further information please refer to: Potassium Hydroxide.pdf
General information to this topic: Wet Etching.pdf

TMAH (25 %) Tetramethylammonium hydroxide

Available from 2.5 L sales volumes on in ULSI quality.

For further information please refer to: TMAH.pdf
General information to this topic: Wet Etching.pdf

Sales Volumes, Shipping and Pricing

Available Sales Units of Buffered Hydrofluoric Acid

  • Bottles á 2.5 L (also single bottles)
  • 30 or 200 L drums on request

Our typical lead time is 1-3 working days within Germany, lead times to other countries on request. On demand, in urgent cases our etchants can be shipped within 24 hours to a destination inside Germany.

Please send us your request.

e-mail: sales(at)
phone: +49 (0)731 977 343 0
fax: +49 (0)731 977 343 29

Thank you very much for your interest!

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