TMAH 25% - 2.50 l - VLSI - EVE/EUD!
TECHNIC France
TMAH is mainly used for anisotropic silicon etching when metal ion free processing is required.
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Product number:
TTMV1025
Manufacturer:
TECHNIC France
Product information "TMAH 25% - 2.50 l - VLSI - EVE/EUD!"
TMAH
Tetramethylammonium hydroxide
General Information
TMAH is mainly used for anisotropic silicon etching when metal ion free processing is required. TMAH (25%) is available in VLSI-quality, which is the usual purity grades applied in semiconductor processing and micro-electronics.
Further Information
MSDS:
Safety Data Sheet TMAH 25 % (VLSI) english
Sicherheitsdatenblatt TMAH 25 % (VLSI) german
Specs:
Specs TMAH 25 % (VLSI)
Application Notes:
Wet Etching english
Nasschemisches Ätzen german
| Purity: | VLSI |
|---|
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General Information
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Data on selectivity and compatibility are manufacturer information and do not claim to be complete. Please contact us for further details.
Further Information
MSDS:
Safety Data Sheet Ammonium Hydroxide Solution (VLSI) 28-30% english
Specs:
Specs Ammonium Hydroxide Solution (VLSI) 28-30%
Application Notes:
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General Information
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Further Information
MSDS:
Safety Data Sheet KOH Solution 44% (VLSI) english
Sicherheitsdatenblatt KOH Solution 44% (VLSI) german
Specs:
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Application Notes:
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Further Information about Processing
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General Information
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H2O2 (30%) is available in VLSI-quality, which is the usual purity grades applied in semiconductor processing and micro-electronics.
Further Information
MSDS:
Safety Data Sheet Hydrogen Peroxide 30% (VLSI) english
Sicherheitsdatenblatt Hydrogen Peroxide 30% (VLSI) german
Specs:
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Application Notes:
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