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AZ® 2033 MIF Developer MicroChemicals GmbH
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AZ 2033 MIF Developer - 5.00 l

AZ® 2033 MIF Developer is 3.00 % TMAH in H2O with surfactants added for fast and homogeneous substrate wetting and further additives for removal of resist residuals.

Product information "AZ 2033 MIF Developer - 5.00 l"

AZ® 2033 MIF Developer

Metal Ion-free Developers

 

General Information

AZ® 300 MIF, AZ® 326 MIF, AZ® 726 MIF and AZ® 2026 MIF Developers are developer formulations with 2.38 % TMAH (tetramethylammoniumhydroxide) in H2O.
The AZ® 726 MIF Developer contains additionally a surfactant for better wetting and easy to settle up of puddle development. Additionally to the wetting agent of the AZ® 726 MIF the AZ® 2026 MIF contains a scum remover for complete and scum-free removal of resist layers on the price of a slightly higher dark erosion ratio. However, for our negative resists, such as AZ® nLof 2000 series, AZ® 15nXT series, AZ® 125nXT resists this developer shows outstanding performance. Even for a positive resist like AZ® 10XT resist it significantly reduces t-topping if this problem occurs.

AZ® 2033 MIF is 3.00 % TMAH in H2O with surfactants added for fast and homogeneous substrate wetting and further additives for removal of resist residuals (residues in certain lacquer families), but at the cost of a higher dark removal. Compared to the AZ® 2026 MIF, the normality is not 0.26 but 0.33. Thus the development rate is higher with the AZ® 2033 MIF Developer.

Further Information

MSDS:
Safety Data Sheet AZ® 2033 MIF Developer english
Sicherheitsdatenblatt AZ® 2033 MIF Entwickler german

TDS:
Technical Data Sheet AZ® 2033 MIF Developer english

Application Notes:
Development of Photoresist english
Entwicklung von Fotolack german

Developer Type: metal ion free (MIF)

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