Developers
Which Developer for which Purpose?
First of all, it has to be checked whether the developer
has to be metal ion free (MIF) or if alternatively metal
ion containing (MIC) developers can be used. Most MIF
developers are ready-to-use solutions, while typical mic
developers are supplied as concentrate which has to be
diluted before use.
MIF Developers
AZ® 326MIF
(Datasheet as PDF)
AZ® 726MIF
(Datasheet as PDF)
AZ® 826MIF
(Datasheet as PDF)
MIC Developers
AZ® 400K
(Datasheet as PDF)
AZ® 351B
(Datasheet as PDF)
AZ® 303
(Datasheet as PDF)
AZ® Developer (Datasheet as
PDF)
AZ® 326MIF
AZ® 326 MIF is 2.38 % TMAH (TetraMethylAmmoniumHydroxide)
in H2O.
For further information refer AZ® MIF_Developer.pdf
AZ® 726MIF
AZ® 726 MIF is 2.38 % TMAH in H2O with surfactants
added for fast and homogeneous substrate wetting.
For further information refer AZ® MIF_Developer.pdf
AZ® 826MIF
AZ® 826 MIF is 2.38 % TMAH in
H2O with surfactants
added for fast and homogeneous substrate wetting, and
further additives for removal of resist residuals
occasionally remaining after development. These
additives, however, slightly increase the dark erosion.
For further information refer AZ® MIF_Developer.pdf
AZ® Developer
(MIC)
AZ® Developer (MIC) is optimized for minimum Al attack.
It is typically applied 1:1 diluted in DI-H2O for high
contrast, or undiluted for a high development rate. The
dark erosion of AZ® Developer is slightly higher as
compared to other developers.
For further information refer AZ® Developer.pdf
AZ® 351B (MIC)
AZ® 351B (MIC) is based on buffered NaOH and
typically used in 1:4 dilution.
For further information refer AZ® 351B (MIC).pdf
AZ® 400K (MIC)
AZ® 400K (MIC) is based on buffered KOH and typically
used in 1:4 dilution.
For further information refer AZ® 400K (MIC).pdf
AZ® 303 (MIC)
AZ® 303 (MIC) is based on KOH and NaOH and designed for
the resist AZ® 111 XFS.
The next selection characteristics is the compatibility
of the developer to a certain
photoresist or/and a certain substrate material (table
overleaf, bottom).
For further information refer AZ® 303 (MIC).pdf
®AZ, the AZ logo, BARLi , Aquatar and Kallista are
registered trademarks of AZ Electronic Materials.
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